000 | 03298cam a2200445Ia 4500 | ||
---|---|---|---|
003 | BUC | ||
005 | 20220330085505.0 | ||
008 | 200119s2006 enka gob 000 0 eng d | ||
010 | _a2006299211 | ||
020 | _a1860946364 | ||
020 | _a9781860946363 | ||
020 | _a1860949037 (ebook) | ||
020 | _a9781860949036 (ebook) | ||
020 | _a9786611867218 | ||
020 | _a661186721X | ||
040 |
_aBADR UNIVERSITY IN CAIRO _beng _cBADR UNIVERSITY IN CAIRO _erda |
||
041 | _aeng | ||
050 | 4 |
_aTK7871.15.N57 _bA1299 2006eb |
|
082 | 0 | 4 |
_a541.377 _222 _bINI |
245 | 1 | 0 |
_aIII-nitride _bsemiconductor materials / _ceditor, Zhe Chuan Feng. |
260 |
_aLondon : _bImperial College Press ; _aSingapore ; _aHackensack, NJ : _bDistributed by World Scientific, _cc2006. |
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300 |
_a1 online resource (xii, 428 p.) : _bill. |
||
504 | _a.Includes bibliographical references | ||
505 | _aCover -- Contents -- Preface -- Chapter 1 Hydride vapor phase epitaxy of group III nitride materials -- 1. Introduction -- 2. Experiment -- 3. Material Properties -- 3.1. Undoped GaN layers -- 3.2. Si-doped GaN layers -- 3.3. Mg-doped GaN layers -- 3.4. Zn-doped GaN layers -- 3.5. AlN layers -- 3.6. AlGaN layers -- 3.7. InN and InGaN layers -- 4. New directions in HVPE development -- 4.1. Large area and multi wafer HVPE growth -- 4.2. Multi-layer structures -- 4.3. P-n junctions -- 4.4. Structures with two dimensional carrier gas -- 4.5. Nano structures and porous materials -- 5. Applications of HVPE grown group III nitride materials -- 5.1. Substrate applications -- 5.2. Device Applications -- 6. Conclusions -- Chapter 2 Planar MOVPE technology for epitaxy of III-nitride .materials -- 1. History of Reactor Development for III-Nitrides | ||
520 | _aIII-Nitride semiconductor materials - (Al, In, Ga)N - are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This book presents the new developments and achievements in the field. Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory or experiment. The III-Nitride-based industry is building up and new economic developments from these materials are promising. It is expected that III-Nitride-based LEDs may replace traditional light bulbs to realize a revolution in lighting. This book is a valuable source of information for engineers, .scientists and students working towards such goals | ||
588 | _a.Description based on print version record | ||
650 | 0 |
_aSemiconductors _xMaterials. |
|
650 | 0 | _aNitrides. | |
650 | 6 | _aSemiconducteurs. | |
650 | 6 |
_aNitrures _xPropriétés électriques. |
|
650 | 6 |
_aÉlectronique _xMatériaux. |
|
650 | 6 | _aDépôt en phase vapeur par organométalliques. | |
650 | 7 |
_aSCIENCE _xChemistry _xPhysical & Theoretical. _2bisacsh. |
|
655 | 4 | _aElectronic books. | |
700 | 1 | _aFeng, Zhe Chuan. | |
902 | _aN.Tolba | ||
942 |
_2ddc _cBK |
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999 |
_c2145 _d2145 |